JPH0345639U - - Google Patents
Info
- Publication number
- JPH0345639U JPH0345639U JP10637989U JP10637989U JPH0345639U JP H0345639 U JPH0345639 U JP H0345639U JP 10637989 U JP10637989 U JP 10637989U JP 10637989 U JP10637989 U JP 10637989U JP H0345639 U JPH0345639 U JP H0345639U
- Authority
- JP
- Japan
- Prior art keywords
- wafer stage
- plasma
- vacuum container
- ashing apparatus
- ashing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004380 ashing Methods 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10637989U JPH0345639U (en]) | 1989-09-12 | 1989-09-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10637989U JPH0345639U (en]) | 1989-09-12 | 1989-09-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0345639U true JPH0345639U (en]) | 1991-04-26 |
Family
ID=31655110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10637989U Pending JPH0345639U (en]) | 1989-09-12 | 1989-09-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0345639U (en]) |
-
1989
- 1989-09-12 JP JP10637989U patent/JPH0345639U/ja active Pending